decap:epoxy
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| decap:epoxy [2018/02/27 20:49] – [Sandblast] mcmaster | decap:epoxy [2025/08/04 21:23] (current) – external edit 127.0.0.1 | ||
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| - | [[live_analysis|Live analysis considerations]] | + | Also known as "plastic" |
| - | + | ||
| - | ====== Background ====== | + | |
| - | + | ||
| - | [[carrier: | + | |
| + | See also | ||
| + | * [[: | ||
| + | * [[carrier: | ||
| + | * [[live_analysis|Live analysis considerations]] | ||
| ====== Getting started ====== | ====== Getting started ====== | ||
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| One problem from this lack of circulation is that it may create pockets of low concentration acid, leading to corrosion. | One problem from this lack of circulation is that it may create pockets of low concentration acid, leading to corrosion. | ||
| + | ===== McMaster live 2019-11-10 ===== | ||
| - | ====== Live analysis considerations ====== | + | {{: |
| - | Commercial " | + | Experiments trying |
| - | Sulphuric acid may be added to nitric acid to help preserve copper, if present (see the acid page for details). | + | |
| - | ====== See also ====== | + | TLDR best result |
| + | - Cut a polypropylene tube (ie from a microfuge tube) roughly the size you want to expose to acid | ||
| + | - Heat tube up to soften it | ||
| + | - Warm PCB | ||
| + | - Attach hot tube to PCB, letting plastic deform into place | ||
| + | - Let cool a little | ||
| + | - Seal outside of tube with silicone | ||
| + | - Let silicone cure | ||
| + | - Decap with gentle heat on hotplate (maybe 160F max) using 2 WFNA : 1 H2SO4 | ||
| - | [[: | + | Above is a compromise between PP providing the best chemical resistance and silicone providing the best seal |
| + | {{: | ||
| - | ====== Laser ====== | + | Above: hardened silicone bubbles on WFNA surface |
| - | General results | + | Silicone only experiment |
| - | * Some settings work decent | + | * Made silicon dam by layering up |
| - | * Risk of melting bond wires and/or die | + | * Silicone surface cured, but internally didn't always |
| - | * Use lower power and/or pulsed? | + | * Uncured silicone dissolved in WFNA and floated to top. This then cured and blocked the surface |
| - | * Practice on samples before trying something you care about | + | * Interesting, |
| - | * Puts off nasty fumes. Make sure to have good ventilation | + | * Acid may eventually undermine the PCB, but eating the silicone itself came first |
| + | * Consider using a lot more silicone than you need to help mitigate acid splashes | ||
| + | * Maybe cover board surface with kapton? | ||
| - | https://www.jamiecraig.com/ | + | Someone also suggested I should try PTFE gasket. In the past I had tried kapton which didn' |
| - | * Seemed to work okay | + | |
| - | * What would it look like if touched up with WFNA? | + | |
| - | {{:decap:epoxy: | + | Reference: https://twitter.com/ |
| - | Above: poor results. Maybe from CO2 laser | + | ====== Live analysis considerations ====== |
| - | http:// | + | Commercial " |
| - | * Poor results | + | Sulphuric acid may be added to nitric acid to help preserve copper, if present (see the acid page for details). |
| - | * Cranberry glass | + | |
| - | https:// | ||
| - | * Gold backing block | ||
| - | * Good leadframe exposure | ||
| - | * Die unclear how well exposed | ||
| - | * Scanned entire chip (including die area) up until the end | ||
| - | https:// | + | ====== Laser ====== |
| - | * Cavity into pic | + | |
| - | * Gives a close up at the end | + | |
| - | + | ||
| - | https:// | + | |
| - | * Laser Decapsulation FALIT System Software | Image Templates | + | |
| - | * Pro system demo | + | |
| - | https:// | + | [[decap:laser]] |
| - | * They do the whole chip but avoid die area | + | |
| - | * Light Ray - IC Decapsulation | + | |
| Line 259: | Line 254: | ||
| - | ====== A. Zonenberg etch rate measurement ====== | ||
| - | |||
| - | FIXME: move this somewhere better | ||
| - | |||
| - | Copper etch - 70 ml 3% H2O2 + 10 ml conc. HCl. Heat to 70C, agitate with magnetic stirrer. | ||
| - | |||
| - | Test sample was Altera Stratix IV. Silver or tin plated copper. Plating was gone after <1 min in etchant, metallurgy of the plating was not studied. 20 minutes of etching = 0.13mm removal so 6.5 um/min. This number is likely +/- 30% or so because the temperature of the solution slowly increased over the etch period. | ||
| ====== References ====== | ====== References ====== | ||
decap/epoxy.1519764585.txt.gz · Last modified: 2018/02/27 20:49 by mcmaster
