foundry:start
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| foundry:start [2013/12/27 23:20] – azonenberg | foundry:start [2025/11/17 23:53] (current) – mcmaster | ||
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| A foundry is an IC fabrication facility. | A foundry is an IC fabrication facility. | ||
| + | |||
| + | This page lists all known foundries regardless of whether they are internal-only or offer their services to the public. | ||
| ====== List of foundries ====== | ====== List of foundries ====== | ||
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| {{topic> | {{topic> | ||
| - | ====== | + | ====== |
| + | |||
| + | Device vendors concerned about reverse engineering often use simple tricks to make it harder to put a BOM together. One of these is to remove the labeling from, or even re-label with a laser engraver, various ICs on the board. Re-labeling can also be done for brand reasons. | ||
| + | |||
| + | The first step in identifying an unknown components is to determine the vendor. If there' | ||
| + | |||
| + | This page is a library of specific process examples, not a place to discuss general fabrication techniques. General fab topics belong on the [[siliconprawn> | ||
| + | |||
| + | ====== CMP fill ====== | ||
| + | |||
| + | Although only present on smaller (<=350nm typically) process technology, CMP fill patterns are distinctive enough that a pretty good guess of the vendor can sometimes be obtained from the fill pattern alone. | ||
| + | |||
| + | All images shown are top metal with overglass intact, unless otherwise labeled. | ||
| + | |||
| + | Please try to include scale bars in all images. | ||
| + | ===== Actel ===== | ||
| + | |||
| + | {{: | ||
| + | |||
| + | ===== Adaptec ===== | ||
| + | |||
| + | {{: | ||
| + | |||
| + | ===== ATI radeon ===== | ||
| + | |||
| + | {{: | ||
| + | |||
| + | ===== Atmel ===== | ||
| + | |||
| + | ==== 350nm aluminum ==== | ||
| + | |||
| + | FIXME: get a picture with a scale bar | ||
| + | |||
| + | The fill pattern is very distinctive and looks like a "brick wall" - short lines staggered every other row. | ||
| + | |||
| + | {{: | ||
| + | |||
| + | (image copyright Christopher Tarnovsky, originally published on [[http:// | ||
| + | |||
| + | ===== Cisco Systems ===== | ||
| + | |||
| + | {{: | ||
| + | |||
| + | IBM logo on chip. Am100x objective? | ||
| + | |||
| + | ===== FTDI ===== | ||
| + | |||
| + | {{: | ||
| + | |||
| + | ===== Microchip ===== | ||
| + | |||
| + | ==== 350nm aluminum ==== | ||
| + | |||
| + | Example image from PIC12F683. Overglass generally appears deep red to orange, CMP fill is long straight lines. | ||
| + | |||
| + | {{: | ||
| + | |||
| + | ==== 250nm copper ==== | ||
| + | |||
| + | The exact geometry of this process isn't known but it's copper damascene and significantly smaller than the 350. | ||
| + | |||
| + | Example image from ENC424J600. Overglass appears orange to yellow. CMP fill is short lines. | ||
| + | |||
| + | |||
| + | {{: | ||
| + | |||
| + | ==== pic32mx695f ==== | ||
| + | |||
| + | {{: | ||
| + | |||
| + | ===== Myricom ===== | ||
| + | |||
| + | {{: | ||
| + | |||
| + | ===== NXP / Philips | ||
| - | 0.25 um - 0.14 um | + | ==== Unknown geometry, possibly 220nm ==== |
| - | 200 mm and 300 mm wafers | + | |
| - | ====== Northrup Gruman ====== | + | Fill pattern is large square patches of metal with spaces between them. |
| - | Nortrup Grumman Electronic Systems (Blatimore, MD) | + | {{: |
| - | Northrup Grumman Space Technology (Redondo Beach, CA) | + | |
| - | ====== Peregrine ====== | + | ===== Sysmocom |
| - | Processes | + | {{: |
| - | * GA @ 0.25 µm | + | |
| - | * GC @ 0.25 µm | + | |
| - | * FA @ 0.50 µm | + | |
| - | * FC @ 0.50 µm | + | |
| - | ====== Rayethon RF Components ====== | + | Has several fill patterns, second metal down is somewhat visible |
| - | Andower, MA | + | ====== Routing ====== |
| - | ====== SAMSUN Semiconductor ====== | + | ===== Power ===== |
| - | Processes | + | ===== Cell ===== |
| - | * 90 nm | + | |
| - | * 65 nm | + | |
| - | * 45 nm | + | |
| - | * 45/40nm | + | |
| - | * 32/28nm | + | |
| - | 300 mm wafers | ||
| - | ====== | + | ====== |
| - | Princeton, NJ | + | Smartcard vendors are extremely secretive and competitive and the mesh patterns are all developed in house. If a device has mesh on it, a matching pattern can typically be considered a positive ID of the vendor. |
| - | ====== Semiconductor Manufacturing International Corporation (SMIC) ====== | + | ===== Atmel ===== |
| - | 0.35 um to 90nm | + | ===== Infineon ===== |
| - | ====== Taiwan Semiconductor Manufacturing Company Limited (TSMC) ====== | + | ===== Renesas |
| - | Produces ICs for many third parties include such large organizations as nVidia. | + | Die labeled R5H30201, found in an unlabeled QFN. |
| - | TODO: image some nVidia chips to see if we can capture some identifying marks. | + | |
| - | Processes | + | |
| - | * CLN40/CMN40 @ 40 nm | + | |
| - | * CLN45/CMN45 @ 45 nm | + | |
| - | * CLN65/CMN65 @ 65 nm | + | |
| - | * CLN90/CMN90 @ 90 nm | + | |
| - | * CL013/CM013 @ 0.13 µm | + | |
| - | * CL013LP @ 0.13 µm | + | |
| - | * CL013LV @ 0.13 µm | + | |
| - | * CL018/CM018 @ 0.18 µm | + | |
| - | * CL018HV @ 0.18 µm | + | |
| - | * CL018LP @ 0.18 µm | + | |
| - | * CL018LV @ 0.18 µm | + | |
| - | * CL025/CM025 @ 0.25 µm | + | |
| - | * CL035/CM035 @ 0.35 µm | + | |
| - | * CL035HV_BCD @ 0.35 µm | + | |
| - | * CL035HV_DDD @ 0.35 µm | + | |
| - | * "65 nm, 90 nm, 0.13um, 0.15 / 0.18 µm, 0.22 / 0.25µm, 0.30 / 0.35µm, 0.5 µm" | + | |
| - | {{topic> | + | The mesh runs vertically and horizontally. |
| - | ====== Texas Instruments (TI) ====== | + | FIXME: get image rotated to canonical orientation on an edge of the die |
| - | Processes | + | {{: |
| - | * 32 nm | + | |
| - | * 45 nm | + | |
| - | * 90 nm | + | |
| - | * 130 nm | + | |
| - | * 200 mm wafers | + | |
| - | ====== TowerJazz ====== | + | {{: |
| + | ===== ST ===== | ||
| - | Israel: 6” and 8” | + | ST7 series smartcard, origin unknown. The mesh runs at a 45 degree angle to the vertical axis of the chip and consists of two conductors. |
| - | US: 8” | + | This is one of the few images we have taken with a SEM rather than a light microscope because they' |
| - | China " | + | The sample was not sputter-coated with anything conductive and had severe charging problems, this was the only image I got that was useful. |
| - | " | + | FIXME: get image rotated into canonical orientation on an edge of the die |
| - | ====== TriQuint Semiconductor ====== | + | {{: |
| - | TriQuint Semiconductor Texas (Richardson, | + | ===== Xilinx ===== |
| - | ====== United Microelectronic Corporation | + | XC6SLX4 |
| - | Processes | + | {{: |
| - | * 28 nm | + | |
| - | * 40 nm | + | |
| - | * 65 nm | + | |
| - | * 90 nm | + | |
| - | * 0.13 um | + | |
| - | * 0.15 um | + | |
| - | * 0.18 um | + | |
| - | * 0.25 um | + | |
| - | * 0.35 um | + | |
| - | * 0.5 um | + | |
| - | * 0.6 um | + | |
| - | * 8" wafers | + | |
| - | {{topic> | + | ====== Test patterns ====== |
| - | ====== Vanguard International Semiconductor Corporation (VIS) ====== | + | Test patterns and alignment marks are often very fab or vendor specific. |
| - | 0.18um to 0.5um | + | ====== Misc ====== |
| - | 8" wafers | + | ===== SandForce SF-2281VB1-SDC ===== |
| - | ====== X-FAB Semiconductor Foundries ====== | + | {{: |
| - | "CMOS; 1.0 - 0.18 µm modular mixed-signal CMOS technologies. BiCMOS; 0.6 µm technology. SOI-CMOS; 0.6 µm & 1.0 µm CMOS and BCD technology on SOI substrates. MEMS Technologies. CUSP" | ||
| ====== References ====== | ====== References ====== | ||
| + | - http:// | ||
| - http:// | - http:// | ||
| - http:// | - http:// | ||
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| - http:// | - http:// | ||
| - http:// | - http:// | ||
| - | - http:// | ||
| - http:// | - http:// | ||
| - | - http:// | ||
foundry/start.1388186450.txt.gz · Last modified: 2013/12/27 23:20 by azonenberg
